FAQ - Plasmaris
Unlocking the Future of RF Technology with Light-Controlled Innovation
Why is your insertion loss so low?
We use light-activation of free electron and hole pairs in intrinsic semiconductors, this creates what is known as a plasma (that’s where our name comes from!) and results in very low on-state resistance and very high off-state resistance simultaneously.
Why is your power handling so good?
Since our insertion loss is so low, we naturally dissipate small amounts of heat which helps power handling. We also have patent-pending (DJC144021P.GBA) heat-sinking technology to dissipate any remaining heat.
Why is your signal distortion so low?
The fact that we have no built-in PN junctions or heterostructures means that we have inherently very low signal distortion.
Why is your bandwidth so wide?
This is because our technology uses an optically generated electronic-hole plasma which naturally has no gate capacitance and thus very wide bandwidth.
What sort of light source do you use?
We use Vertical Cavity Surface Emitting Lasers (VCSELs). This is a low-cost and small-sized light source with small diffraction angle and excellent integratability, which guarantees the excellent RF performance and compactness of our RF devices.
How do you integrate the VCSELs?
We use patent-pending integration technology to achieve this in a low-cost and manufacturable way.
What is the fundamental Physics behind your technology?
You can read about this in our publications:
Y.Zhang, A.W.Pang, M. J. Cryan, “Optically controlled millimetre-wave switch with stepped-impedance lines, IET Microwaves, Antennas & Propagation, Volume 13, Issue 10, 14 August 2019, p. 1737 – 1741 (doi: 10.1049/iet-map.2018.6191)
A.W.Pang, S. Bensmida, C. D. Gamlath, M. J. Cryan, “Non-linear Characteristics of an Optically Reconfigurable Microwave Switch”, IET Microwaves, Antennas & Propagation, Volume 12, Issue 7, 13 June 2018, p. 1060 – 1063 (10.1049/iet-map.2017.0572)
D. Gamlath, D.M. Benton, M.J. Cryan, “Microwave Properties of an Inhomogeneous Optically Illuminated Plasma in a Microstrip Gap”, IEEE Transactions on Microwave Theory and Techniques, Vol:63, Iss: 2, Feb 2015 (10.1109/TMTT.2014.2387276).
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